氧化锆 (CAS No.1314-23-4)
- 物化性质
- 白色粉末或固体，密度约5.68 g/cm³，熔点约2700°C，沸点约4300°C，硬度高，热稳定性和化学惰性强，不溶于水，耐多数酸碱腐蚀。高纯产品具有优异的绝缘性能和低杂质析出特性。
- 技术参数
- 纯度 ≥99.999%（5N），满足半导体级无杂质污染要求。 密度约5.68 g/cm³，熔点约2700°C，适用高温及宽温域工况。 耐等离子体腐蚀等级优于10^-6 g/cm²·h，可长期耐受氟基、氯基等离子体。 绝缘电阻≥10^14 Ω·cm，可避免等离子体漏电，保障设备运行安全。 表面粗糙度Ra≤0.05 μm，适合高精密刻蚀/沉积设备部件。
English description（英文原文，共 1519 字符）
Product Name:Zirconium dioxide
English Name:Zirconium dioxide
CAS No.:1314-23-4
Aliases:Zirconia, Zirconium(IV) oxide, Zirconium oxide
Molecular Formula:ZrO2
Physical Properties:White powder or solid with a density of approx. 5.68 g/cm³, melting point of approx. 2700°C, and boiling point of approx. 4300°C. It has high hardness, excellent thermal stability and chemical inertness, is insoluble in water, and resists most acids and alkalis. High-purity grades exhibit outstanding insulating properties and low contamination release.
Uses:Zirconia is mainly used for semiconductor etch chamber liners, deposition equipment nozzles, electrode support components and chip packaging materials, protecting equipment and wafers from plasma corrosion and contamination. It is also applied as an electronic component encapsulation material, improving device stability and service life through its high insulation, thermal stability and mechanical strength.
Technical Specifications:
Purity ≥99.999% (5N), meeting semiconductor-grade no-contamination requirements.
Density approx. 5.68 g/cm³ and melting point approx. 2700°C, suitable for high-temperature and wide-temperature-range conditions.
Plasma etching resistance better than 10^-6 g/cm²·h, with long-term durability against fluorine- and chlorine-based plasmas.
Insulation resistance ≥10^14 Ω·cm, preventing plasma leakage and ensuring safe equipment operation.
Surface roughness Ra ≤0.05 μm, suitable for high-precision etch/deposition equipment components.
English Name:Zirconium dioxide
CAS No.:1314-23-4
Aliases:Zirconia, Zirconium(IV) oxide, Zirconium oxide
Molecular Formula:ZrO2
Physical Properties:White powder or solid with a density of approx. 5.68 g/cm³, melting point of approx. 2700°C, and boiling point of approx. 4300°C. It has high hardness, excellent thermal stability and chemical inertness, is insoluble in water, and resists most acids and alkalis. High-purity grades exhibit outstanding insulating properties and low contamination release.
Uses:Zirconia is mainly used for semiconductor etch chamber liners, deposition equipment nozzles, electrode support components and chip packaging materials, protecting equipment and wafers from plasma corrosion and contamination. It is also applied as an electronic component encapsulation material, improving device stability and service life through its high insulation, thermal stability and mechanical strength.
Technical Specifications:
Purity ≥99.999% (5N), meeting semiconductor-grade no-contamination requirements.
Density approx. 5.68 g/cm³ and melting point approx. 2700°C, suitable for high-temperature and wide-temperature-range conditions.
Plasma etching resistance better than 10^-6 g/cm²·h, with long-term durability against fluorine- and chlorine-based plasmas.
Insulation resistance ≥10^14 Ω·cm, preventing plasma leakage and ensuring safe equipment operation.
Surface roughness Ra ≤0.05 μm, suitable for high-precision etch/deposition equipment components.
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常见问题
- 氧化锆的 CAS 号是多少？
- 氧化锆的 CAS 号是 1314-23-4。
- 氧化锆的分子式和分子量是什么？
- 氧化锆的分子式为 ZrO2。
- 氧化锆的英文名称是什么？
- 氧化锆的英文名称为 Zirconium dioxide。
- 氧化锆还有哪些别名？
- 氧化锆又称 二氧化锆、氧化锆喷粉。
- 氧化锆有哪些供应商和生产厂家？
- 掌上化工当前收录 1 条氧化锆供应报价，来自 1 家供应商，可按地区、纯度、级别筛选对比。
- 氧化锆的供应商主要分布在哪些地区？
- 氧化锆的供应商主要分布在 上海市（1 条） 等地。
- 氧化锆有哪些级别可选？
- 平台上氧化锆的供应级别包括 工业级。
- 氧化锆的报价单位是什么？
- 氧化锆的报价单位主要有 千克。
- 哪里可以查到氧化锆的价格？
- 掌上化工氧化锆产品页汇总了各供应商的最新报价与规格，地址：/chemicals/1314-23-4/。部分供应商价格为电议，可通过页面上的询价功能直接获取。
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