低温真空等离子处理机 (CAS No.None)
- 物化性质
- 在真空状态（约10~100Pa）下，通过电场使气体转变为等离子体态（物质的第四态），含大量电子、离子、光子和自由基等活性粒子；这些高能粒子与材料表面发生物理/化学反应，可改变材料表面性质。采用进口等离子电源电路技术和放电结构，确保等离子体均匀分布。
English description（英文原文，共 1329 字符）
Product Name:Low-Temperature Vacuum Plasma Processor
English Name:Low-Temperature Vacuum Plasma Processor
Aliases:Vacuum Plasma Cleaner, Desktop Vacuum Plasma Treatment Instrument
Physical Properties:Under vacuum (about 10-100 Pa), an electric field is applied to the gas to convert it into a plasma state (the fourth state of matter), containing many active species such as electrons, ions, photons, and free radicals. These high-energy particles react physically or chemically with material surfaces to modify their surface properties. Imported plasma power circuit technology and discharge structure ensure uniform plasma distribution.
Uses:Used for surface cleaning, activation, and modification of materials. It removes surface organics, improves adhesion, surface wettability, biocompatibility, and surface energy, and improves surface roughness.
Technical Specifications:
Model: VPS-RF05; Frequency: 13.56 MHz with automatic impedance matching.
Power: 0-200 W continuously adjustable.
Chamber material: imported-grade 316L stainless steel; Chamber volume: 5 L.
Ultimate vacuum: 1 Pa; Gas flow control: MFC mass flow controller; 2 gas lines for O2, Ar, N2, H2, etc.; corrosive gases require customization.
Control: 4.3-inch touch screen + PLC; Power supply: AC220V/50Hz; Vacuum pump: oil pump/dry pump (optional).
English Name:Low-Temperature Vacuum Plasma Processor
Aliases:Vacuum Plasma Cleaner, Desktop Vacuum Plasma Treatment Instrument
Physical Properties:Under vacuum (about 10-100 Pa), an electric field is applied to the gas to convert it into a plasma state (the fourth state of matter), containing many active species such as electrons, ions, photons, and free radicals. These high-energy particles react physically or chemically with material surfaces to modify their surface properties. Imported plasma power circuit technology and discharge structure ensure uniform plasma distribution.
Uses:Used for surface cleaning, activation, and modification of materials. It removes surface organics, improves adhesion, surface wettability, biocompatibility, and surface energy, and improves surface roughness.
Technical Specifications:
Model: VPS-RF05; Frequency: 13.56 MHz with automatic impedance matching.
Power: 0-200 W continuously adjustable.
Chamber material: imported-grade 316L stainless steel; Chamber volume: 5 L.
Ultimate vacuum: 1 Pa; Gas flow control: MFC mass flow controller; 2 gas lines for O2, Ar, N2, H2, etc.; corrosive gases require customization.
Control: 4.3-inch touch screen + PLC; Power supply: AC220V/50Hz; Vacuum pump: oil pump/dry pump (optional).
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常见问题
- 低温真空等离子处理机的 CAS 号是多少？
- 低温真空等离子处理机的 CAS 号是 None。
- 低温真空等离子处理机的英文名称是什么？
- 低温真空等离子处理机的英文名称为 Low-Temperature Vacuum Plasma Processor。
- 低温真空等离子处理机还有哪些别名？
- 低温真空等离子处理机又称 真空等离子清洗机、小型桌面型真空等离子处理仪。
- 低温真空等离子处理机有哪些供应商和生产厂家？
- 掌上化工当前收录 1 条低温真空等离子处理机供应报价，来自 1 家供应商，可按地区、纯度、级别筛选对比。
- 低温真空等离子处理机的供应商主要分布在哪些地区？
- 低温真空等离子处理机的供应商主要分布在 上海市（1 条） 等地。
- 低温真空等离子处理机有哪些级别可选？
- 平台上低温真空等离子处理机的供应级别包括 工业级。
- 低温真空等离子处理机的报价单位是什么？
- 低温真空等离子处理机的报价单位主要有 千克。
- 哪里可以查到低温真空等离子处理机的价格？
- 掌上化工低温真空等离子处理机产品页汇总了各供应商的最新报价与规格，地址：/chemicals/di-wen-zhen-kong-deng-li-zi-chu-li-ji/。部分供应商价格为电议，可通过页面上的询价功能直接获取。
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