JY-S100小型离子溅射仪 (CAS No.None)
- 英文名称
- JY-S100 Small Ion Sputter Coater
- 所属类别
- 试剂实验设备
- 物化性质
- 采用低压直流磁控头进行冷态精细喷镀，避免样品表面受损；数字化喷镀电流控制不受样品室内气压影响，可得到一致的镀膜速率和高质量镀膜效果；支持多种金属靶材，靶材更换快速方便。
- 技术参数
- 样品仓尺寸为120x120mm；靶材标配Au，可选Pt，直径57mm，厚度0.1mm。 标准样品台可装载12个SEM样品座，高度可调范围60mm；可选配旋转倾斜样品台，旋转速度0~60rpm连续可调，倾斜角度-90°~90°。 溅射电流由微处理器控制，可调范围5~30mA，具有安全互锁功能，计时范围1~999s。 真空系统抽气速率为133L/min，极限真空0.05Pa，运行噪音56dB。 控制方法设有“开始”“暂停”按钮，可实现自动抽气、自动溅射、关机后自动放气。
English description（英文原文，共 1304 字符）
Product Name:JY-S100 Small Ion Sputter Coater
English Name:JY-S100 Small Ion Sputter Coater
Physical Properties:It uses a low-voltage DC magnetron head for cold-state fine sputtering, avoiding damage to the sample surface. The digital sputtering current control is independent of the chamber pressure, ensuring consistent coating rate and high-quality film result. It supports multiple metal targets with quick and easy replacement.
Uses:It is used for high-quality coating of non-conductive samples for scanning electron microscopy (SEM), providing conductivity to obtain clear and stable electron microscope images.
Technical Specifications:
Sample chamber size: 120×120 mm; target is Au by default, Pt optional, diameter 57 mm, thickness 0.1 mm.
Standard sample stage can hold 12 SEM sample holders with height adjustable range of 60 mm; optional rotating and tilting stage with rotation speed 0-60 rpm continuously adjustable, tilt angle -90° to 90°.
Sputtering current is microprocessor-controlled, adjustable from 5 mA to 30 mA, with safety interlock and timing range of 1-999 s.
Vacuum system pumping speed: 133 L/min; ultimate vacuum: 0.05 Pa; noise: 56 dB.
Control method includes "Start" and "Pause" buttons, with automatic evacuation, sputtering, and automatic venting after shutdown.
English Name:JY-S100 Small Ion Sputter Coater
Physical Properties:It uses a low-voltage DC magnetron head for cold-state fine sputtering, avoiding damage to the sample surface. The digital sputtering current control is independent of the chamber pressure, ensuring consistent coating rate and high-quality film result. It supports multiple metal targets with quick and easy replacement.
Uses:It is used for high-quality coating of non-conductive samples for scanning electron microscopy (SEM), providing conductivity to obtain clear and stable electron microscope images.
Technical Specifications:
Sample chamber size: 120×120 mm; target is Au by default, Pt optional, diameter 57 mm, thickness 0.1 mm.
Standard sample stage can hold 12 SEM sample holders with height adjustable range of 60 mm; optional rotating and tilting stage with rotation speed 0-60 rpm continuously adjustable, tilt angle -90° to 90°.
Sputtering current is microprocessor-controlled, adjustable from 5 mA to 30 mA, with safety interlock and timing range of 1-999 s.
Vacuum system pumping speed: 133 L/min; ultimate vacuum: 0.05 Pa; noise: 56 dB.
Control method includes "Start" and "Pause" buttons, with automatic evacuation, sputtering, and automatic venting after shutdown.
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- JY-S100小型离子溅射仪的英文名称为 JY-S100 Small Ion Sputter Coater。
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