通用台式马弗炉CVD管式炉 (CAS No.None)
- 物化性质
- 炉体后部设有直径0.95 cm端口,可用于接入独立检测元件以监测炉内及样品温度;炉膛采用经热处理的陶瓷内衬,提高加热效率;加热元件分布在炉腔两侧,支持快速升温并减小温度偏离;标配排气孔,可排除污染气体和湿气,保护加热和检测元件,延长使用寿命。
English description(英文原文,共 1388 字符)
Product Name:General Purpose Benchtop Muffle Furnace
English Name:General Purpose Benchtop Muffle Furnace
Aliases:Muffle Furnace
Physical Properties:A 0.95 cm diameter port at the rear of the furnace allows connection of an independent sensing element to monitor furnace and sample temperature. The chamber is lined with heat-treated ceramic to improve heating efficiency. Heating elements are located on both sides of the chamber for rapid heating and reduced temperature deviation. A standard vent port removes contaminating gases and moisture, protecting heating and sensing elements and extending service life.
Uses:Used for high-temperature heat treatment such as ashing, sintering, and melting of samples. Can be equipped with ceramic partition plates to process double the sample quantity. Suitable for high-temperature processes in laboratories and small-scale production.
Technical Specifications:
Chamber volume: 2 L (model F47900) or 5.8 L (model F48000)
Operating temperature range: 100-1200 °C, maximum 1200 °C
Temperature performance at 1000 °C: uniformity ±4.8 °C (F47900)/±3.6 °C (F48000); stability ±0.4 °C (F47900)/±0.2 °C (F48000)
Control system: standard A1 digital single setpoint controller; optional B1 (with mechanical over-temperature protection) or C1 (8-segment programmable control)
Power supply: 240 V 50/60 Hz; power 1000 W (F47900)/1560 W (F48000)
English Name:General Purpose Benchtop Muffle Furnace
Aliases:Muffle Furnace
Physical Properties:A 0.95 cm diameter port at the rear of the furnace allows connection of an independent sensing element to monitor furnace and sample temperature. The chamber is lined with heat-treated ceramic to improve heating efficiency. Heating elements are located on both sides of the chamber for rapid heating and reduced temperature deviation. A standard vent port removes contaminating gases and moisture, protecting heating and sensing elements and extending service life.
Uses:Used for high-temperature heat treatment such as ashing, sintering, and melting of samples. Can be equipped with ceramic partition plates to process double the sample quantity. Suitable for high-temperature processes in laboratories and small-scale production.
Technical Specifications:
Chamber volume: 2 L (model F47900) or 5.8 L (model F48000)
Operating temperature range: 100-1200 °C, maximum 1200 °C
Temperature performance at 1000 °C: uniformity ±4.8 °C (F47900)/±3.6 °C (F48000); stability ±0.4 °C (F47900)/±0.2 °C (F48000)
Control system: standard A1 digital single setpoint controller; optional B1 (with mechanical over-temperature protection) or C1 (8-segment programmable control)
Power supply: 240 V 50/60 Hz; power 1000 W (F47900)/1560 W (F48000)
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常见问题
- 通用台式马弗炉CVD管式炉的 CAS 号是多少?
- 通用台式马弗炉CVD管式炉的 CAS 号是 None。
- 通用台式马弗炉CVD管式炉的英文名称是什么?
- 通用台式马弗炉CVD管式炉的英文名称为 General Purpose Benchtop Muffle Furnace。
- 通用台式马弗炉CVD管式炉还有哪些别名?
- 通用台式马弗炉CVD管式炉又称 马弗炉。
- 通用台式马弗炉CVD管式炉有哪些供应商和生产厂家?
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- 掌上化工通用台式马弗炉CVD管式炉产品页汇总了各供应商的最新报价与规格,地址:/chemicals/tong-yong-tai-shi-ma-fu-lu-cvd-guan-shi-lu/。部分供应商价格为电议,可通过页面上的询价功能直接获取。
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