硅化铪 (CAS No.12401-56-8)
- 物化性质
- 黑色粉末，分子量234.66，密度（20℃）8.02 g/cm³，熔点1680℃，沸点约2800℃，不溶于水，溶于氢氟酸。
- 纯度
- ≥99.9%，可满足高纯应用要求。
- 外观
- 黑色粉末，无结块。
- 储存条件
- 密封保存，置于阴凉、通风库房，远离火种，避免与氧化剂混储。
English description（英文原文，共 1135 字符）
Product Name:Hafnium disilicide
English Name:Hafnium disilicide
CAS No.:12401-56-8
Aliases:Hafnium silicide
Molecular Formula:HfSi2
Physical Properties:Black powder; molecular weight 234.66; density 8.02 g/cm³ at 20 °C; melting point 1680 °C; boiling point approximately 2800 °C; insoluble in water, soluble in hydrofluoric acid.
Uses:Hafnium disilicide is a transition metal silicide with a high melting point and good oxidation resistance. It is widely used in complementary metal-oxide-semiconductor (CMOS) devices as gate contact layers and diffusion barriers, as well as in thin-film coatings, bulk structural components, electric heating elements, and thermoelectric materials. In addition, hafnium disilicide nanomaterials show potential applications in catalysis.
Technical Specifications:
Purity: ≥99.9%, suitable for high-purity applications.
Particle size: D50 2–8 μm with uniform distribution.
Specific surface area: ≥5 m²/g with high surface activity.
Appearance: black powder, free of agglomeration.
Storage conditions: keep sealed in a cool, ventilated warehouse, away from fire sources and oxidizing agents.
English Name:Hafnium disilicide
CAS No.:12401-56-8
Aliases:Hafnium silicide
Molecular Formula:HfSi2
Physical Properties:Black powder; molecular weight 234.66; density 8.02 g/cm³ at 20 °C; melting point 1680 °C; boiling point approximately 2800 °C; insoluble in water, soluble in hydrofluoric acid.
Uses:Hafnium disilicide is a transition metal silicide with a high melting point and good oxidation resistance. It is widely used in complementary metal-oxide-semiconductor (CMOS) devices as gate contact layers and diffusion barriers, as well as in thin-film coatings, bulk structural components, electric heating elements, and thermoelectric materials. In addition, hafnium disilicide nanomaterials show potential applications in catalysis.
Technical Specifications:
Purity: ≥99.9%, suitable for high-purity applications.
Particle size: D50 2–8 μm with uniform distribution.
Specific surface area: ≥5 m²/g with high surface activity.
Appearance: black powder, free of agglomeration.
Storage conditions: keep sealed in a cool, ventilated warehouse, away from fire sources and oxidizing agents.
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常见问题
- 硅化铪的 CAS 号是多少？
- 硅化铪的 CAS 号是 12401-56-8。
- 硅化铪的分子式和分子量是什么？
- 硅化铪的分子式为 HfSi2。
- 硅化铪的英文名称是什么？
- 硅化铪的英文名称为 Hafnium disilicide。
- 硅化铪还有哪些别名？
- 硅化铪又称 硅化铪、二硅化铪。
- 硅化铪有哪些供应商和生产厂家？
- 掌上化工当前收录 1 条硅化铪供应报价，来自 1 家供应商，可按地区、纯度、级别筛选对比。
- 硅化铪的供应商主要分布在哪些地区？
- 硅化铪的供应商主要分布在 上海市（1 条） 等地。
- 硅化铪有哪些级别可选？
- 平台上硅化铪的供应级别包括 工业级。
- 硅化铪的报价单位是什么？
- 硅化铪的报价单位主要有 千克。
- 哪里可以查到硅化铪的价格？
- 掌上化工硅化铪产品页汇总了各供应商的最新报价与规格，地址：/chemicals/12401-56-8/。部分供应商价格为电议，可通过页面上的询价功能直接获取。
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