高真空CVD1200管式炉 (CAS No.None)
- 物化性质
- 该设备为卧式真空管式炉,炉管可选外径φ50、φ60、φ80、φ100 mm,长度1000 mm。采用PID自动控制晶闸管(可控硅)输出功率,30段程序控温,极限温度1200℃,工作温度≤1150℃,控温精度±1℃。配备完全无油的干式高真空泵组,分子泵抽速61 L/s,极限总压可达5.0×10⁻⁴ Pa(10⁻⁶ mbar)。
English description(英文原文,共 1741 字符)
Product Name:High Vacuum CVD1200 Tube Furnace
English Name:High Vacuum CVD1200 Tube Furnace
Aliases:CVD Tube Furnace, Vacuum Tube Furnace
Physical Properties:This is a horizontal vacuum tube furnace with optional tubes of outer diameter φ50, φ60, φ80, and φ100 mm, length 1000 mm. It features PID automatic control of thyristor output and a 30-segment programmable controller. The maximum temperature is 1200 °C, working temperature ≤1150 °C, and temperature control accuracy ±1 °C. Equipped with an oil-free dry high-vacuum pump set, the molecular pump pumping speed is 61 L/s, and the ultimate total pressure reaches 5.0×10⁻⁴ Pa (10⁻⁶ mbar).
Uses:Primarily used for chemical vapor deposition (CVD) processes, such as thin film preparation, nanomaterial synthesis, annealing and sintering of materials. Suitable for research and small-scale production in semiconductors, new energy, catalytic materials and other fields.
Technical Specifications:
Tube size: outer diameter φ50, φ60, φ80, φ100 × 1000 mm
Temperature performance: maximum temperature 1200 °C, working temperature ≤1150 °C, temperature control accuracy ±1 °C, max heating/cooling rate 20 °C/min, heating zone 400 mm, constant temperature zone 200 mm
Temperature controller: PID automatic control of thyristor output, 30-segment programmable controller
Vacuum system: dry high-vacuum pump set, molecular pump pumping speed 61 L/s, ultimate total pressure 5.0×10⁻⁴ Pa (10⁻⁶ mbar); inlet DN63 ISO-K, connector φ6 double-ferrule stainless steel
Gas system: multi-channel mass flow controllers, standard ranges 100/200/200/500 sccm (calibrated with N2), accuracy ±1.5%, operating differential pressure 0.1~0.5 MPa, max pressure 3 MPa; power supply: single-phase 220V, 50Hz
English Name:High Vacuum CVD1200 Tube Furnace
Aliases:CVD Tube Furnace, Vacuum Tube Furnace
Physical Properties:This is a horizontal vacuum tube furnace with optional tubes of outer diameter φ50, φ60, φ80, and φ100 mm, length 1000 mm. It features PID automatic control of thyristor output and a 30-segment programmable controller. The maximum temperature is 1200 °C, working temperature ≤1150 °C, and temperature control accuracy ±1 °C. Equipped with an oil-free dry high-vacuum pump set, the molecular pump pumping speed is 61 L/s, and the ultimate total pressure reaches 5.0×10⁻⁴ Pa (10⁻⁶ mbar).
Uses:Primarily used for chemical vapor deposition (CVD) processes, such as thin film preparation, nanomaterial synthesis, annealing and sintering of materials. Suitable for research and small-scale production in semiconductors, new energy, catalytic materials and other fields.
Technical Specifications:
Tube size: outer diameter φ50, φ60, φ80, φ100 × 1000 mm
Temperature performance: maximum temperature 1200 °C, working temperature ≤1150 °C, temperature control accuracy ±1 °C, max heating/cooling rate 20 °C/min, heating zone 400 mm, constant temperature zone 200 mm
Temperature controller: PID automatic control of thyristor output, 30-segment programmable controller
Vacuum system: dry high-vacuum pump set, molecular pump pumping speed 61 L/s, ultimate total pressure 5.0×10⁻⁴ Pa (10⁻⁶ mbar); inlet DN63 ISO-K, connector φ6 double-ferrule stainless steel
Gas system: multi-channel mass flow controllers, standard ranges 100/200/200/500 sccm (calibrated with N2), accuracy ±1.5%, operating differential pressure 0.1~0.5 MPa, max pressure 3 MPa; power supply: single-phase 220V, 50Hz
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常见问题
- 高真空CVD1200管式炉的 CAS 号是多少?
- 高真空CVD1200管式炉的 CAS 号是 None。
- 高真空CVD1200管式炉的英文名称是什么?
- 高真空CVD1200管式炉的英文名称为 High Vacuum CVD1200 Tube Furnace。
- 高真空CVD1200管式炉还有哪些别名?
- 高真空CVD1200管式炉又称 CVD管式炉、真空管式炉。
- 高真空CVD1200管式炉有哪些供应商和生产厂家?
- 掌上化工当前收录 1 条高真空CVD1200管式炉供应报价,来自 1 家供应商,可按地区、纯度、级别筛选对比。
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- 高真空CVD1200管式炉的供应商主要分布在 上海市(1 条) 等地。
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- 平台上高真空CVD1200管式炉的供应级别包括 工业级。
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